Wafer Direct Bonding

Wafer Direct Bonding

Fraunhofer IZM offers direct bond of 300mm wafers

Category:

Description

Fraunhofer IZM offers direct bond services. This includes oxide-oxide bonding as well as hybrid (Oxide-Oxide, Cu-Cu) bonding of 300mm wafers. The service includes in-situ preparation (e.g. cleaning, activation). Upon request, planarization via CMP can also be provided.


Specifications

  • Wafer size: 300mm
  • Bond type: Oxide-Oxide, Cu-Cu
  • Cleaning: in-situ
  • Activation: in-situ

Ascent+ facility
Fraunhofer-IZM

Platform Technologies

  • Advanced Integration

Key Enabling Capability

  • Processing

Case Study

3D structuring of SiC for vias, membranes, recesses, etc.

Additional information

Key Enabling Capability

Processing

Platform Technology

Advanced Integration

Facility

Fraunhofer Mikroelektronik