Description
200mm semiautomatic probe station with a chuck temperature capability range from -60°C to 200°C. The prober has 5 independent DC positioners for manual characterisation along with a probe card capability. Fully automated single wafer characterisation is also a feature with sub-micron accuracy on chuck alignment/movement. On wafer RF measurements capability with adapted DC positioners.
Keywords
High temperature, low temperature, -60°C, 300°C, RF, electrical characterisation
Specifications
Model: Cascade Summit 11000/12000
Wafer size: Up to 200mm wafers
Temperature Range: -60°C to 200°C
Fully Automated: Single Wafer
RF on Wafer characterisation: Yes to 110GHz
Ascent+ facility
Tyndall
Platform Technologies
- Nano for Quantum Technologies
- Disruptive Devices
Key Enabling Capability
- Metrology / Characterisation: Electrical characterisation
Case Study
A researcher wants to investigate the effect of low-T plasma treatment on Si nanowires (NWs). Using Tyndall test devices fabricated on SiO2-Si wafer in Tyndall. First they carry out comprehensive electrical characterisation of the devices during visit to the facility. Plasma treatment is then performed at the user’s. The treated devices are then electrically characterised again. The results show how the plasma treatment diffuses doping impurity from surface to bulk of the silicon NWs at low temperature and decrease the contact resistivity between metal contact and Si NW. [Click here for more details]
