FIB-SEM

A tool that combines a Scanning Electron Microscope (SEM) and a Focused Ion Beam (FIB) capability for sub-10-nm fabrication/patterning and materials analysis. A precise tool for real-time maskless micro-/nano-fabrication or for preparing TEM samples.

FEI Helios NanoLab 450S Dual Beam system is a highly versatile tool that combines SEM with FIB of gallium ions. The SEM operates with a field emission gun (FEG) that provides high beam intensity and stability. Imaging can be done with secondary (for SEM and FIB) and backscattered (for SEM) electrons. A STEM detector delivers resolution of 0.8 nm at 30 kV. For element analysis and mapping an EDX detector is available. An ultra-high resolution (UHR) stage and flip (for TEM lamella preparation) stages are available inside the microscope.

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Specifications

  • Voltage (e/i+): 0.5–30kV
  • HRSEM Imaging (Resolution 0.9nm)
  • Detectors: ETD, TLD, BSD, STEM (segmented – BF, DF and HAADF)
  • EDX (Chemical analysis)
  • FIB – Ga+ ions (Imaging/Patterning)
  • TEM Lamella preparation
  • Cross-section analysis
  • Slice & View (3D reconstruction)
  • Patterning: Milling/Deposition (Pt or W)
  • Enhanced etching (Iodine) and Selective Carbon Etching (MgSO4·7H2O)
  • Ultra-high resolution (UHR) and flip stages are available inside the microscope
  • Fast entry lock chamber

Ascent+ facility
INL

Platform Technologies

  • Nano for Quantum Technologies
  • Disruptive Devices
  • Advanced Integration

Key Enabling Technologies

  • Metrology/Characterisation: Physical characterisation
  • Processing

Case Study

A user needs a lamella sample to be prepared for TEM imaging, this system has the comprehensive set of capabilities required for performing this task.

A user needs to inspect the internal structure of a device or device component. This system enables destructive analysis by preparing an individual cross-section or a sequential series of cross-section (for Slice & View imaging and 3D reconstruction). High-performance SEM provides the necessary imaging and EDX capabilities.

Key Enabling Capability

Metrology / Characterisation, Processing

Platform Technology

Advanced Integration, Disruptive Devices, Nano for Quantum Technologies

Facility

INL